Nanodevices Research Group
Optical characterization lab
The laboratory, located at the Department of Physics and Astronomy of Padova University, is equipped with gimbal-piston isolated optical tables offering several distinct optical lines for the characterization and test of optical elements in the visible (supercontinuum laser) and in the telecom range (1310 nm, 1550 nm). Different optical architectures can be assembled, depending on the specific application and on the type of optics under test. 4 Liquid-crystal-on Silicon-Spatial light modulators are available (8-bit depth, #2 in the VIS, #2 in the O- and C-band of telecom IR) for the generation of structured light beams, hologram testing, phase/amplitude complex patterns analysis, phase correction, and turbulence studies. The availability of SPAD detectors and time taggers allows extending the analyses in the IR to the single photon regime.
Typical case studies include but are not limited to:
- diffractive optics and metasurfaces optical characterization
- spatial division (de)multiplexing
- free-space propagation of spatial modes and structured beams
- studies on exotic beams, caustics and caustic beams
- analysis on spatial modes injection and propagation in multi-mode optical fibers
CNR-IOM Laboratory for Nanofabrication of Nanodevices
The CNR-IOM laboratory is one of the most important nanofabrication centers in Italy, with infrastructures including a 100mq clean room with a wide range of manufacturing and process tools including a FIB-SEM dual beam for nanofabrication and microanalysis and a soft-lithography platform.
The research center ISO 6 (class 1000) clean room is equipped with chemical and laminar (ISO 2) flow hoods and outfitted with the following nanofabrication/characterization instrumentation:
Our main workhorse for electron beam lithography, with algorithmic execution of exposure jobs optimized for metalenses and with precise metrology tools.
Mask Aligner equipped with two 365 nm UV lamps and allowing for double-side lithography, with alignment mask-mask and mask-sample.
An ICP system dedicated to dry ethcing, cleaning and surface functionalization of samples.
An high vacuum system for physical vapour deposition through evaporation of materials, equipped with a 10 KV electron gun and ~0.1nm-precise thickness monitor
An high vacuum system for physical vapour deposition through magnetron sputtering, it can work with either RF or DC voltages.
30KeV Dual Beam equipped for Nanoscale Prototyping, Machining, and Topographic, Morphological, Compositional and IC and PIC Failure Analysis
